Silica based polishing of {100} and {111} single crystal diamond

نویسندگان

  • Evan L H Thomas
  • Soumen Mandal
  • Emmanuel B Brousseau
  • Oliver A Williams
چکیده

Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.

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عنوان ژورنال:

دوره 15  شماره 

صفحات  -

تاریخ انتشار 2014